National Repository of Grey Literature 5 records found  Search took 0.01 seconds. 
Yttrium oxide layers for antireflection coating of silicon solar cells
Dostál, Vladimír ; Boušek, Jaroslav (referee) ; Hégr, Ondřej (advisor)
This work deals with deposition of yttrium oxide layers on silicon substrate (P – type) by using magnetron and reactive magnetron sputtering. Experiments which were made are further described. After that, work is focused on evaluation of deposited layers by using FTIR measurement technique and spectrophotometry. At the end of the work results of experiments are discussed also with the future progress.
Preparation and basic properties of nanostructured plasma polymers
Serov, Anton ; Biederman, Hynek (advisor) ; Čech, Vladimír (referee) ; Novák, Stanislav (referee)
Smooth fluorocarbon plasma polymer films have been for a long time considered for fabrication of hydrophobic and slippery coatings. Interest in fluorocarbon materials was also supported by their excellent self-lubricant, dielectric properties and chemical inertness. This thesis is focused on development of new methods for fabrication of fluorocarbon plasma polymes, which could combine the chemical composition and the physical structure necessary for reaching superhydrophobic character of coatings. Poly(tetrafluoroethylene) was the subject material. RF magnetron sputtering using gas aggregation cluster source was the method adapted to fabricate fluorocarbon nanostructured films with chemical composition close to conventional bulk PTFE, but with high degree of cross- linking and branched structure. A model of growth of such plasma polymer nanostructures was discussed.
Yttrium oxide layers for antireflection coating of silicon solar cells
Dostál, Vladimír ; Boušek, Jaroslav (referee) ; Hégr, Ondřej (advisor)
This work deals with deposition of yttrium oxide layers on silicon substrate (P – type) by using magnetron and reactive magnetron sputtering. Experiments which were made are further described. After that, work is focused on evaluation of deposited layers by using FTIR measurement technique and spectrophotometry. At the end of the work results of experiments are discussed also with the future progress.
Study of intrinsic stress in CNx films prepared by magnetron sputtering device using electron microscopy
Mikmeková, Eliška ; Sobota, Jaroslav ; Caha, O. ; Mikmeková, Šárka
Preparation and analysis of amorphous carbon nitride thin films (CNx) deposited by RF magnetron sputtering device on silicon wafers (100) is reported.
Amorfní tenké vrstvy Ag-Sb-S připravené radiofrekvenčním magnetronovým naprašováním
Gutwirth, J. ; Wágner, T. ; Drašar, Č. ; Beneš, L. ; Vlček, M. ; Hrdlička, M. ; Frumar, M. ; Schwarz, J. ; Tichá, H. ; Peřina, Vratislav
Thin Ag-Sb-S films were prepared by RF magnetron sputtering as potential candidates for rewritable optical data storage films. There were prepared polycrystalline bulks of AgSbS2. Composition and homogeneity of these bulks were checked. Targets for RF magnetron sputtering were prepared from pulverized bulks by hot pressing technique. Targets were characterized the same way as bulks. Composition and homogeneity of prepared thin films were characterized by SEM-EDX and RBS/ERDA, amorphous/crystalline character was studied by XRD. Optical properties (spectral dependence of refractive index) were evaluated on basis of UV-Vis-NIR spectroscopy and variable angle spectral ellipsometry (VASE). Crystallization abilities were traced by thermal dependence of optical transmission of prepared thin films.

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